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Intern - F10 Process and Equipment Engineer

micron · Fab 10N/X

New
Internship Junior 🇬🇧 English

Job description

About the role

Micron Technology, Inc. is recruiting an intern as an F10 Process and Equipment Engineer in its Process and Equipment Engineering department in Singapore. The project, titled Workstation Defects Improvement Evaluation, evaluates material solutions and process conditions to reduce manufacturing defects and improve process robustness in dry etch operations, focusing on synthetic quartz rings and periodic conditioning techniques. It is open to students in any engineering discipline.

Key responsibilities

  • Study dry etch process principles, with emphasis on dielectric etching behaviour
  • Evaluate synthetic quartz rings and conditioning approaches through structured engineering analysis
  • Review process data to understand defect trends and sources of variation
  • Develop qualification plans and timelines for material and process evaluations
  • Take part in discussions with engineers on process characterisation, statistical analysis and experimental design
  • Produce a technical summary of dry etch fundamentals and tool overview, documented evaluation results, a structured report with findings and recommendations, and a final presentation

Required profile

  • Student currently pursuing a degree in any engineering discipline (Electrical, Electronic, Chemical, Materials, Mechanical, Chemistry or related)
  • Curiosity and interest in semiconductor manufacturing and process engineering
  • Willingness to learn and engage in structured project work

Required skills

  • Fundamental engineering knowledge from academic coursework
  • Logical thinking and ability to interpret technical data
  • Learning agility

The internship lasts a minimum of 5 months, full-time, semester-long from January to May 2027.

Questions fréquentes

Le salaire n'est pas communiqué publiquement par le recruteur. Vous pouvez postuler et négocier directement avec micron.
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Le contrat proposé est un Internship basé à Fab 10N/X.
Source : ats:workday

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Published 3 days ago

Expires 1 month from now

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micron

Fab 10N/X