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Principal Engineer/MTS, Photolithography Process Development (NAND)

micron · Fab 10N/X

New
Senior 🇬🇧 English
Photolithography Immersion lithography OPC DOE Lithography simulation tools

Job description

About the role

Micron is hiring a Principal Engineer/MTS for its R&D Technology Development group to lead advanced photolithography process development for next-generation memory devices. The role drives innovation in process integration and technology transfer across Micron's global manufacturing network.

Key responsibilities

  • Lead development and optimization of photolithography processes to meet yield, quality and performance targets for advanced technology nodes.
  • Define and translate future device requirements into process specifications and equipment roadmaps.
  • Promote early adoption of new process and equipment solutions and integrate disruptive technologies into production flows.
  • Collaborate with global R&D teams and manufacturing sites to ensure seamless technology transfer.
  • Partner with suppliers to accelerate breakthrough solutions and maintain strategic vendor relationships.
  • Implement advanced process control using statistical tools, DOE and simulation software.
  • Conduct material evaluations, reticle/layout/OPC development, process window analysis and overlay optimization.
  • Generate intellectual property through patents and publications, mentor colleagues and influence technology strategy.

Required profile

  • M.S. or Ph.D. in Electrical Engineering, Materials Science, Physics, Chemical Engineering or a related field.
  • 10+ years in semiconductor photolithography or related process engineering (exceptional candidates with 7+ years considered).
  • Proven track record of defining and executing photolithography process and equipment roadmaps.
  • Strong understanding of semiconductor process flows and memory architecture.

Required skills

  • Deep expertise in optics, immersion lithography, polarized illumination and low k1 imaging.
  • Lithography simulation tools, material characterization and statistical analysis.
  • Preferred: experience with 365nm, 248nm, 193nm materials and EUV processes, hands-on equipment and metrology tool experience, and leading cross-functional projects.

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Source : ats:workday

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Published 1 day ago

Expires 1 month from now

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micron

Fab 10N/X