Research Fellow – Thin Film Materials

About the role

The NTI‑NTU Corporate Laboratory, a collaboration between Nanofilm Technologies International Ltd and Nanyang Technological University, is looking for a Research Fellow to develop and characterise advanced oxide and nitride thin‑film composite coatings.

Key responsibilities

• Operate and optimise PVD and CVD plasma‑based processes for advanced thin‑film deposition.
• Perform oxide and nitride composite thin‑film deposition and conduct in‑depth materials characterisation.
• Design and execute independent experiments, collect and interpret data to support project objectives.
• Troubleshoot process issues and develop experimental methods using strong analytical skills.
• Utilise data‑analysis software, simulation tools and programming languages for modelling, optimisation and reporting.
• Collaborate with engineering teams to transition lab‑scale results to scalable, production‑ready solutions.
• Prepare comprehensive technical reports and documentation for grant requirements and stakeholder expectations.

Required profile

• Ph.D. in Materials Science, Chemical Engineering, Physics or a closely related discipline.
• Minimum of 2 years post‑doctoral experience in industry or a recognised research institute.
• Extensive experience in characterising thin‑film composite coatings, especially oxide and nitride systems.
• Proven ability to work effectively in multidisciplinary teams.

Required skills

• PVD (Physical Vapor Deposition)
• CVD (Chemical Vapor Deposition)
• Plasma‑based processing
• Thin‑film deposition techniques
• Oxide and nitride composite coating development
• Materials characterisation methods
• Data‑analysis software
• Simulation tools
• Programming languages for modelling and reporting