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Senior Member of Technical Staff - Process Development, Thin Films (CVD/Diffusion), NAND

micron · Fab 10N/X

New
Senior 🇬🇧 English
PECVD thermal CVD ALD RCA FMEA SPC

Job description

About the role

Micron is hiring a Senior Member of Technical Staff (SMTS) for its NAND Advanced Thin Films group. The SMTS acts as a technical authority, setting strategic direction, architecting solutions and leading multi-functional initiatives with department-wide impact. The role drives innovation adoption, influences technical standards, leads advanced development, fixing and integration, and builds engineering capability through mentorship.

Key responsibilities

  • Define technical strategy and lead multi-functional projects in structural and electrical film development.
  • Architect solutions, promote innovative technologies across teams and influence standards and process improvements.
  • Lead advanced process development, fixing and integration, validating device/process linkages via wafer-level electricals.
  • Solve complex problems across process, structure, hardware and device interactions (RCA, FMEA, SPC, corrective actions).
  • Lead vendor engagements to push hardware and process capability, secure resources and set achievements.
  • Mentor engineers, build SME pipelines, publish internal papers and BKMs and present to senior leadership.
  • Use AI-assisted tools to improve efficiency, quality and effectiveness, and share AI-enabled improvements.

Required profile

  • PhD with at least 12 years, or Master's degree with at least 15 years, of relevant experience in Electrical Engineering, Materials Science, Chemical Engineering, Physics or a related field.
  • Extensive thin-film R&D and process development experience.
  • Recognized technical authority, strong mentorship and clear executive communication.
  • Preferred: demonstrated leadership in multi-functional development and vendor collaboration.

Required skills

  • Advanced thin-film processing proficiency (PECVD, thermal CVD, ALD) and hands-on equipment optimization for dielectric and carbon films.
  • Characterization and correlation modeling linking process parameters to reliability and scaling behavior.
  • Understanding of process-mechanical-device interactions and NAND scaling.

Questions fréquentes

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Source : ats:workday

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Published 1 day ago

Expires 1 month from now

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micron

Fab 10N/X