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Staff Engineer, Advanced NAND Photolithography Process Development

micron · Fab 10N/X

New
Senior 🇬🇧 English
Photolithography OPC SPC DOE Lithography simulation Immersion lithography EUV DUV

Job description

About the role

Micron is hiring a Staff Engineer for its advanced NAND photolithography process development team. The role leads the development, optimization and troubleshooting of photolithography processes to meet yield, quality and performance requirements, and owns the delivery of process milestones from development through transfer readiness.

Key responsibilities

  • Lead development, optimization and troubleshooting of photolithography processes to meet yield, quality and performance requirements.
  • Translate device and integration requirements into process flows, specifications and control strategies.
  • Perform and own material evaluations, OPC/layout development, process window analysis and overlay optimization.
  • Design and implement advanced process control using SPC, DOE and lithography simulation tools.
  • Own delivery of photolithography process milestones from development through transfer readiness.
  • Partner with global R&D and manufacturing teams to ensure effective technology transfer.
  • Work with equipment and materials suppliers to evaluate new capabilities and improvements.
  • Contribute to invention disclosures and technical documentation.
  • Integrate AI-assisted tools into daily work and share AI-enabled improvements with colleagues.

Required profile

  • PhD with at least 3 years, or Master's with at least 5 years, or Bachelor's with at least 7 years of relevant experience in Electrical Engineering, Materials Science, Chemical Engineering, Physics or a related field.
  • Demonstrated experience in semiconductor photolithography process development.
  • Proven track record contributing to and delivering photolithography process and equipment roadmaps.
  • Preferred: experience with advanced DUV and EUV, supplier interaction and early technology adoption.

Required skills

  • Deep knowledge of optics, immersion lithography, polarized illumination and low k1 imaging.
  • Lithography simulation tools, material characterization, DOE, SPC and basic statistical data analysis.
  • Ability to apply baseline digital fluency and role-appropriate AI literacy to use AI tools responsibly.

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Source : ats:workday

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Published 1 day ago

Expires 1 month from now

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micron

Fab 10N/X