Intern - ADTS PEE Dry Etch Process Improvement

About the role

Micron is offering an internship focused on reducing cumulative error variation in staircase and chop etch processes. The project analyzes manufacturing process and measurement data to develop data-driven control strategies and process improvement recommendations, giving exposure to dry etch processes, staircase flow integration, statistical analysis, data visualization and etching mechanisms relevant to semiconductor process control.

Key responsibilities

• Analyze process and measurement data to identify factors contributing to cumulative error variation.
• Apply statistical analysis and data visualization to evaluate relationships between process conditions and cumulative error performance.
• Develop potential control strategies and recommend improvements to process margins and inline stability.
• Deliver a source-of-variation analysis, data visualizations, at least one proposed control strategy, and a final project presentation to department leadership.

Required profile

• Currently pursuing a degree in Materials Science and Engineering, Chemical Engineering, Electrical or Electronic Engineering, Mechanical Engineering or a related field.
• Ability to commit to a full-time internship of at least five months.
• Interest in semiconductor manufacturing and dry etch processes.

Required skills

• Familiarity with statistical analysis and data visualization.
• Familiarity with machine learning, AI tools or AI-enabled workflows.
• Experience with Python, R, SQL, JMP or similar data analysis tools is advantageous.