Photolithography Process Development Engineer, Advanced NAND

About the role

Micron is hiring a Photolithography Process Development Engineer in its R&D/Technology Development group. You will develop process modules for memory devices and carry out other photolithography and process integration activities, working with Micron engineers, technology partners and vendors to build unit processes for next-generation semiconductors, integrate them in multi-functional teams and transfer the technology to Micron's worldwide manufacturing network. You will also address process issues with pilot-line manufacturing and work on continuous improvements for manufacturability.

Key responsibilities

• Perform material evaluations, reticle, layout and OPC development, process window analysis and overlay optimization
• Document procedures, transfer developed processes and share results with senior management and manufacturing partners
• Work with equipment vendors to improve equipment design, test new equipment and drive process improvements
• Improve cell yield, failure analysis and device performance through process techniques
• Document and present R&D project plans, status and results, including data analysis and interpretation
• Review literature to identify potential intellectual property opportunities and file disclosures
• Drive the R&D photolithography process technology roadmap

Required profile

• Ph.D. in Physics, Optics/Photonics, Electrical Engineering, Materials Science or a field relevant to lithography; candidates with at least 3 years of experience will also be considered
• Understanding of optics, including immersion lithography, polarized illumination and low k1 imaging
• Experience with chemical processes specific to lithography, including materials for 365, 248 and 193 nm lithography
• Familiarity with the architecture of Micron's memory products and semiconductor process flows
• Strong written, verbal and presentation communication skills

Required skills

• Lithography simulation software and its application to low k1 imaging
• Material properties and characterization techniques for lithography
• Statistics, data analysis and Design of Experiments (DOE)