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Senior Member of Technical Staff, Process Development - Cell Film

micron · Fab 10N/X

New
Senior 🇬🇧 English
ALD CVD SIMS XPS TEM EDX/EELS SPC FMEA Root cause analysis

Job description

About the role

Micron is looking for a Senior Member of Technical Staff (SMTS) in process development for its cell film business. The role acts as a technical authority in 3D NAND cell film development, sets strategic direction and leads multi-functional initiatives, influences technical standards and drives process improvements. It involves global projects and mentoring engineers.

Key responsibilities

  • Define technical strategy and lead multi-functional projects in cell film development
  • Architect solutions and promote innovative technologies across teams
  • Influence technical standards and drive process improvements
  • Lead advanced process development, fix and integration
  • Mentor engineers and foster technical growth, contributing to Micron's mentoring programs and building SME pipelines for Cell Films
  • Integrate unit processes into full cell packages and validate device/process linkages via wafer-level electricals
  • Solve complex problems across process/hardware/device interactions using root cause analysis, FMEA, SPC and corrective actions
  • Use characterization tools (SIMS, XPS, TEM, EDX/EELS, electrical stress testing, TDS) to correlate process parameters to device performance and author correlation models
  • Lead multi-functional teams and vendor engagements, and publish internal papers and BKMs

Required profile

  • PhD or equivalent in Materials Science, Chemical Engineering, Physics, Chemistry, Electrical Engineering or a related field
  • 15 to 20 years of experience in thin film research and development for NAND processes, specifically diffusion, CVD and cell films
  • Demonstrated leadership in multi-functional development and vendor collaboration
  • Proven track record in architecting solutions, process-device correlation and mentoring engineers

Required skills

  • Thin film processing: ALD, CVD nitride/oxide systems, multi-layer ONO stack design, barrier and protection layers, batch furnace/RTP integration
  • Hardware optimization: precursor delivery, temperature control, chamber matching, batch vs single wafer trade-offs, metrology hooks
  • Process-device interaction understanding, reliability modeling and 3D NAND scaling
  • Advanced characterization: SIMS, XPS, TEM, electrical stress testing

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Source : ats:workday

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Published 1 day ago

Expires 1 month from now

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micron

Fab 10N/X