Distinguished Member of Technical Staff - CMP Process Development (NAND)
micron · Fab 10N/X
Job description
About the role
Micron is hiring a Distinguished Member of Technical Staff (DMTS) for its Fab 10N/X site, focused on CMP process development for NAND technology. The DMTS acts as the CMP technical authority, defines long-term technology and equipment strategies, leads next-generation CMP innovation and complex yield and defectivity challenges, and mentors senior technical leaders.
Key responsibilities
- Serve as CMP technical authority for NAND technology development, defining long-term technology and equipment strategies
- Architect and drive next-generation CMP process innovation, including FOAK developments, recipe architecture and integration alignment
- Resolve complex yield, defectivity and integration challenges through deep CMP process, materials and layout expertise
- Define and execute CMP hardware and supplier roadmaps, and lead supplier technical reviews and head-to-head evaluations
- Drive cross-functional execution across Technology Development, Process Integration, Manufacturing and Equipment teams
- Identify scaling risks early and drive proactive mitigation strategies
- Mentor senior engineers and represent Micron CMP in cross-site and external technical forums
- Prepare presentations, white papers and patent filings, and initiate collaborations with universities and research institutes
Required profile
- PhD with at least 15 years, or Master's degree with at least 17 years, of relevant experience in Electrical Engineering, Materials Science, Chemical Engineering, Physics or a related field
- Experience in CMP process development within an R&D environment (NAND, DRAM or Logic), with proven transfer to manufacturing
- Publications, patents and a strong record of technical contributions
- Demonstrated technical leadership in complex problem solving and ability to lead high-impact programs
Required skills
- Deep expertise in CMP fundamentals: pad-slush-wafer interactions, mechanistic slurry chemistry and pattern density/layout effects
- Broad knowledge of metal, dielectric, barrier/hardmask and poly-Si/Si CMP processes
- Hands-on experience with advanced 300 mm CMP OEM platforms
- Statistical process control (SPC), data analysis and process qualification
- Technical communication at executive level
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Published 1 day ago
Expires 1 month from now
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micron
Fab 10N/X
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