Research Fellow – Thin Film Materials & Process Development

About the role

The NTI‑NTU Corporate Laboratory is seeking a Research Fellow to lead the characterization and analysis of thin composite materials and thin‑film coatings. The role focuses on advancing plasma‑based PVD and CVD processes for high‑performance material applications within a multidisciplinary research environment.

Key responsibilities

• Support development and optimisation of plasma‑based PVD and CVD processes for advanced materials.
• Operate and maintain semiconductor analysis and metrology tools to evaluate thin‑film and device properties.
• Lead independent investigations, interpret experimental data, and communicate findings effectively.
• Design, implement, and refine experimental methodologies to test hypotheses and explore novel material behaviours.
• Utilise data‑analytics platforms, coding, and simulation environments to deepen process understanding and improve outcomes.
• Translate R&D concepts into practical engineering solutions, bridging research and application.
• Prepare detailed technical documentation and progress reports for funding bodies and internal milestones.

Required profile

• Ph.D. in Materials Science, Chemical Engineering, Physics or a closely related discipline.
• Minimum 2 years of specialised post‑doctoral experience in industry or a recognised research institute.
• Extensive experience in characterising thin‑film coatings, especially using semiconductor or related techniques.
• Proven ability to collaborate effectively in multidisciplinary teams.

Required skills

• Plasma‑based PVD processes
• CVD processes
• Semiconductor analysis and metrology tools
• Thin‑film coating characterisation
• Data‑analytics platforms
• Coding for data processing and simulation
• Simulation environments for process modelling