College Intern – Chemical Vapor Deposition (CVD) Traineeship

About the role

This traineeship offers hands‑on experience in the field of Chemical Vapor Deposition (CVD), focusing on the deposition of SiO₂ and Si₃N₄ thin films used in advanced packaging. The intern will work alongside experienced process engineers to develop, optimize, and characterize CVD processes and films, addressing high‑value problems. You will collaborate with cross‑functional teams such as integration, metrology, and quality.

Key responsibilities

• Understand the fundamentals of CVD.
• Perform recipe development and process tuning for SiO₂ and Si₃N₄ films.
• Conduct Design of Experiments (DOE) to optimize deposition parameters.
• Perform film characterization using ellipsometry, defect, and wafer bow measurements.
• Collaborate with cross‑functional teams such as integration, metrology, and quality.
• Analyze data to identify trends, anomalies, and improvement opportunities.
• Document findings and present results to the team.

Required skills

• Chemical Vapor Deposition (CVD)
• SiO₂ thin‑film processes
• Si₃N₄ thin‑film processes
• Design of Experiments (DOE)
• Ellipsometry
• Defect measurement
• Wafer bow measurement